2012 Lawrence Symposium on Epitaxy
February 20-22, 2012, Scottsdale, AZ
This Lawrence Symposium on Epitaxy provides a forum for presentations and discussions of recent developments, critical issues and potential future directions in the investigation of epitaxy. This forum will address fundamental and practical challenges in materials that are used in advanced photovoltaic, light emitting diode, high power, high speed digital and microwave devices.
As with the past, we hope to attract university, government and industrial researchers. We will ask our industrial colleagues to focus on pre-competitive technologies and anticipate that their open participation will raise the competitiveness of all participating companies.
Areas of particular interest include, but are not limited to:
- Kinetics & thermodynamics of growth
- Engineered precursors for CVD, MOCVD & MBE synthesis
- State of the art in-situ & ex-situ characterization methods
- Integration of dissimilar materials
- Phase segregation & ordering
- Nucleation & coalescence
- Charge imbalance at hetero-interfaces & their influence on morphology
- Origins of threading dislocations in lattice mismatched structures
- Dislocation reduction using novel schemes (e.g. buffer layer, lateral epitaxial growth, interfacial nanoepitaxy, Si3N4 masks & diffusion bonding)
- Mechanism for establishing orientation relationships in lattice-mismatched systems
- Epitaxial properties & influence on device behavior
- LEDs
- Photovoltaic devices
- High power semiconductor electronics
- High speed digital & microwave devices
This Lawrence Symposium on Epitaxy is held in alternate years. The 2012 Symposium will start at 9 a.m. on Monday, February 20 and end at noon on Wednesday, Feb. 22 at the Millennium Resort in Scottsdale Arizona. Registration will include tickets for a welcoming reception on Sunday and the banquet on Tuesday evening. Attendees will be able to register on Sunday. Sessions will include plenary, invited, contributed & poster presentations.
The event will comprise ~15 invited talks lasting 40 minutes, ~24 submitted talks lasting 15 minutes and a Poster Session on Monday night. For the poster session, the presenters will have the opportunity to give a three minute introduction, after the main session on Monday. Participation is limited to 150 attendees to keep it interactive and yet comprehensive.
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